1.Specifications
Tantalum sputtering coating target
Material: R05200, R05252 (Ta-2.5W), R05255 (Ta-10W)
circular targets: Dia 25mm up to 400mm x Thickness 3mm up to 28mm
rectangular targets: Thickness 1mm up to 12.7mm x Width up to 600mmx Length up to 2000mm
Purity: >=99.95% or 99.99%
Surface: bright,polished
Condition: annealed
We can also process according to your request.
Technology parameter
Grade3N, 3N5, 4N, with Ta 99.99%min
Recrystallization95%min
Grain sizeASTM 4 or finer
Surface finish16Rms max. or Ra 0.4 ( RMS64 or better)
Flatness0.1mm or 0.15% max
Tolerance+/-0.010" on all dimensions

Quantitative analysis
ElementOSiHCCrCuFeMgMnMo
Concentration(鈮PM10025103076154810
ElementNiNbNTiWZr
Concentration(鈮PM)53281210335
Purity(Metallic Base) Ta鈮?9.95%
Application:
Widely used in coating processing industries
(1).Magnetic Data Storage Application
(2). Electronic and Semiconductor Appication.
(3). Decoration and Coating Appication. etc.

Advantage of our Ta target
-polised surface with high quality.
- uniform grain with densified microstructure ensures longer use time.
- professional after-sales service
Bulk Tantalum Pipe/wire/target
website:http://www.frlmetal.com/tantalum-niobium/tantalum-pipe-wire-target/