The market for extreme ultraviolet lithography is projected to be worth US$ 1,918.8 million in 2023 and US$ 17,353 million by 2033, growing at a CAGR of 24.6% over that time. The rising use of smartphones around the world is one of the factors boosting the global market for extreme ultraviolet lithography.

Lithography technology was widely applied in microprocessors after its introduction. The development of extreme ultraviolet lithography, an improved lithography technique, is the outcome of ongoing advancements and innovations in the semiconductor sector. Extreme ultraviolet lithography technology is anticipated to phase out currently in use conventional optical lithography techniques during the forecast period.

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Extreme ultraviolet lithography (EUVL) is a technology used in semiconductor manufacturing to produce smaller and more complex integrated circuits. EUVL uses light in the extreme ultraviolet (EUV) range, with wavelengths of 10-14 nanometers, to create patterns on a silicon wafer.

The EUVL market is driven by the increasing demand for higher-performance and lower-power semiconductors in various applications such as smartphones, data centers, and the Internet of Things (IoT). EUVL offers several advantages over traditional lithography techniques, including higher resolution, better contrast, and the ability to produce smaller features. These advantages enable manufacturers to produce more advanced and complex semiconductor chips, which are essential for the development of next-generation technologies.

The EUVL market is expected to grow significantly in the coming years, driven by factors such as increasing investment in semiconductor manufacturing, advancements in EUV light source technology, and the development of new and innovative applications for EUVL. Some of the key players in the EUVL market include ASML, Canon, Intel, Nikon, and Samsung, among others.

However, the market also faces some challenges, such as the high cost of EUVL equipment and the complexity of the manufacturing process. EUVL requires a highly specialized and controlled environment, which can be expensive to maintain. In addition, the development of EUVL technology requires significant investment in research and development, which can be a barrier to entry for smaller companies.

Despite these challenges, the EUVL market is expected to continue growing in the coming years, driven by the increasing demand for advanced semiconductors and the need for more advanced lithography technologies to support their development.

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Market Competition

Intel Corporation,
Nikon Corporation,
Canon Inc.,
IBM Corporation,
ASML, and
Samsung Corporation
are some of the main participants in the Extreme Ultraviolet Lithography industry.

Recent Market Developments in the Extreme Ultraviolet Lithography Market:

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Key Segments Profiled in the Extreme Ultraviolet Lithography Industry Survey

Extreme Ultraviolet Lithography Market by Light Source Type:

Laser Produced Plasmas
Vacuum Sparks
Gas Discharges
Extreme Ultraviolet Lithography Market by Application:

Light Emitting Diodes (LEDs)
Micro-Fluidics
Micro-Needles
Biotechnology
Extreme Ultraviolet Lithography Market by Region:

North America
Latin America
Europe
Asia Pacific